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Optik

High Resolution X-Ray Diffractometry And Topography

Udgivet af Taylor & Francis Ltd

Bogdetaljer

  • Hæftet
  • 264 sider
  • Engelsk
ISBN 9780367400637
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The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and p…

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Bogdetaljer
Forlag Taylor & Francis Ltd
Kategori Optik
ISBN-13 9780367400637
EAN 9780367400637
Format Hæftet
Sprog Engelsk
sider 264
Produktbeskrivelse
The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

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